Clear Alignment on Next Generation Lithography

Eric Meurice
Chairman
ASML Holding

The semiconductor industry has thrived thanks to cooperation, as the sector’s complex supply networks need to align on the industry’s roadmaps. Alignment is also essential to minimize waste of R&D investments, which tend to grow exponentially with every technology transition. The alignment on new technologies looks clearer than ever. The first generation of EUV Lithography is secured for its ramp, starting in 2015 and continuing up to 2019, with a second generation of EUV planned before the potential transition to new, bigger wafer sizes for which prototyping will start this decade.